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Inventor

Yoshitaka Moriyasu

Inventor
Tokyo, JP

Overview

3→
Patents
2003–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
B82YSpecific uses or applications of nanostructures13%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light13%
G01RMeasuring electric variables13%
H10DInorganic electric semiconductor devices13%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
PatentTitleYear
11,002,806Magnetic field detection device20217,768,048'Infrared sensor IC, and infrared sensor and manufacturing method thereof'20106,528,387'SOI substrate and process for preparing the same, and semiconductor device and process for preparing the same'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003Patents assigned to ASAHI CHEMICAL IND (1)· patent assignee history
2003Based in Fuji, JP· patent location history
2010Patents assigned to ASAHI KASEI EMD CORP (1)· patent assignee history
2010Based in Fujinomiya, JP· patent location history
2021Patents assigned to ASAHI KASEI MICRODEVICES CORP (1)· patent assignee history
2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASAHI CHEMICAL IND12003
ASAHI KASEI EMD CORP12010
ASAHI KASEI MICRODEVICES CORP12021
Locations
LocationPatentsSpan
Tokyo, JP12021
Fujinomiya, JP12010
Fuji, JP12003