Inventor

Ching-Huang Lu

Inventor
Fremont, CA, US

Overview

61→
Patents
2013–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 61 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Cprimary
G11CStatic stores24%
H10BElectronic memory devices20%
H01LSemiconductor devices19%
H10DInorganic electric semiconductor devices14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G11BInformation storage based on relative movement between record carrier and transducer2%
Y10TTechnical subjects covered by former us classification2%
H04RLoudspeakers, microphones, gramophone pick-ups or like acoustic electromechanical transducers1%
B81BMicrostructural devices or systems, e.g. micromechanical devices1%
PatentTitleYear
10,878,914Memory device with compensation for program speed variations due to block oxide thinning202010,854,300Multi-state programming in memory device with loop-dependent bit line voltage during verify202010,811,109Multi-pass programming process for memory device which omits verify test in first program pass202010,804,282Three-dimensional memory devices using carbon-doped aluminum oxide backside blocking dielectric layer for etch resistivity enhancement and methods of making the same202010,762,973Suppressing program disturb during program recovery in memory device202010,741,253Memory device with compensation for erase speed variations due to blocking oxide layer thinning202010,706,941Multi-state programming in memory device with loop-dependent bit line voltage during verify202010,692,877Non-volatile memory with silicided bit line contacts202010,685,979Three-dimensional memory device with drain-select-level isolation structures and method of making the same202010,685,978Three-dimensional memory device with drain-select-level isolation structures and method of making the same202010,665,299Memory device with channel discharge before program-verify based on data state and sub-block position202010,665,301Memory device with compensation for program speed variations due to block oxide thinning202010,665,313Detecting short circuit between word line and source line in memory device and recovery method202010,636,501Memory device with reduced neighbor word line interference using adjustable voltage on source-side unselected word line202010,629,272Two-stage ramp up of word line voltages in memory device to suppress read disturb202010,629,616Bonded three-dimensional memory devices and methods of making the same by replacing carrier substrate with source layer202010,566,059Three dimensional NAND memory device with drain select gate electrode shared between multiple strings202010,541,035Read bias adjustment for compensating threshold voltage shift due to lateral charge movement202010,510,413Multi-pass programming with modified pass voltages to tighten threshold voltage distributions201910,482,981Preventing refresh of voltages of dummy memory cells to reduce threshold voltage downshift for select gate transistors201910,446,244Adjusting voltage on adjacent word line during verify of memory cells on selected word line in multi-pass programming201910,373,697Programming dummy memory cells in erase operation to reduce threshold voltage downshift for select gate transistors201910,276,248Early ramp down of dummy word line voltage during read to suppress select gate transistor downshift201910,256,137Self-aligned trench isolation in integrated circuits201910,249,372Reducing hot electron injection type of read disturb in 3D memory device during signal switching transients201910,235,294Pre-read voltage pulse for first read error handling201910,204,689Non-volatile memory with methods to reduce creep-up field between dummy control gate and select gate201910,121,552Reducing charge loss in data memory cell adjacent to dummy memory cell201810,115,464Electric field to reduce select gate threshold voltage shift201810,115,737Charge storage region in non-volatile memory201810,068,651Channel pre-charge to suppress disturb of select gate transistors during erase in memory201810,020,314Forming memory cell film in stack opening201810,008,271Programming of dummy memory cell to reduce charge loss in select gate transistor20189,899,410'Charge storage region in non-volatile memory'20189,852,803Dummy word line control scheme for non-volatile memory20179,830,963Word line-dependent and temperature-dependent erase depth20179,831,114Self-aligned trench isolation in integrated circuits20179,831,118Reducing neighboring word line in interference using low-k oxide20179,779,948'Method of fabricating 3D NAND'20179,761,320'Reducing hot electron injection type of read disturb during read recovery phase in 3D memory'20179,748,266'Three-dimensional memory device with select transistor having charge trapping gate dielectric layer and methods of making and operating thereof'20179,728,551'Multi-tier replacement memory stack structure integration scheme'20179,673,216'Method of forming memory cell film'20179,666,591'Non-volatile memory with silicided bit line contacts'20179,530,785'Three-dimensional memory devices having a single layer channel and methods of making thereof'20169,520,146'Method of forming a fully wrapped-around shielded PMR writer pole'20169,443,861'Fluorine-blocking insulating spacer for backside contact structure of three-dimensional memory structures'20169,437,305'Programming memory with reduced short-term charge loss'20169,437,470'Self-aligned trench isolation in integrated circuits'20169,406,387'Charge redistribution during erase in charge trapping memory'20169,378,832'Method to recover cycling damage and improve long term data retention'20169,324,439'Weak erase after programming to improve data retention in charge-trapping memory'20169,312,010'Programming of drain side word line to reduce program disturb and charge loss'20169,257,191'Charge redistribution during erase in charge trapping memory'20169,252,154'Non-volatile memory with silicided bit line contacts'20169,252,026'Buried trench isolation in integrated circuits'20169,230,663'Programming memory with reduced short-term charge loss'20168,914,969'Method for providing a monolithic shield for a magnetic recording transducer'20148,866,213'Non-Volatile memory with silicided bit line contacts'20148,533,937'Method of forming a fully wrapped-around shielded PMR writer pole'20138,518,832'Process for masking and removal of residue from complex shapes'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2014Patents assigned to WESTERN DIGITAL FREMONT LLC (3)· patent assignee history
2013–2020Based in Fremont, CA, US· patent location history
2014–2016Patents assigned to SPANSION LLC (3)· patent assignee history
2016–2020Patents assigned to SANDISK TECHNOLOGIES LLC (44)· patent assignee history
2016–2017Patents assigned to SANDISK TECHNOLOGIES INC (11)· patent assignee history
2016–2020Patents assigned to CYPRESS SEMICONDUCTOR CORP (7)· patent assignee history
2017Based in San Jose, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SANDISK TECHNOLOGIES LLC442016–2020
SANDISK TECHNOLOGIES INC112016–2017
CYPRESS SEMICONDUCTOR CORP72016–2020
SPANSION LLC32014–2016
WESTERN DIGITAL FREMONT LLC32013–2014
Locations
LocationPatentsSpan
Fremont, California, US602013–2020
San Jose, California, US12017