Inventor
Tamami Takahashi
Inventor
Tokyo, JP
Overview
Patents· 48 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
B01DSeparation8%
C02FTreatment of water, waste water, sewage, or sludge8%
Y02ATechnologies for adaptation to climate change8%
Y02WClimate change mitigation technologies related to wastewater treatment or waste management8%
Y10TTechnical subjects covered by former us classification8%
F15BSystems acting by means of fluids in general4%
LOC134%
F15DFluid dynamics, i.e. methods or means for influencing the flow of gases or liquids3%
PatentTitleYear
10,532,321Seawater desalination system and energy recovery device202010,232,315Seawater desalination system and energy recovery apparatus201910,207,224Seawater desalination system and energy recovery apparatus201910,166,647Polishing apparatus and polishing method201910,137,552Polishing apparatus201810,134,614Substrate peripheral portion measuring device, and substrate peripheral portion polishing apparatus201810,124,295Seawater desalination system and energy recovery apparatus201810,065,152Seawater desalination system and energy recovery apparatus201810,005,034Seawater desalination system and energy recovery apparatus20189,649,739'Polishing apparatus'20179,517,544'Polishing apparatus and polishing method'2016D0752507'Energy exchange chamber'20169,287,158'Substrate processing apparatus'20169,138,854'Polishing apparatus'20159,108,162'Seawater desalination system and energy exchange chamber'2015D0733042'Energy exchange chamber'20159,011,688'Seawater desalination system and energy exchange chamber'20158,986,069'Polishing apparatus and polishing method'20158,771,510'Seawater desalination system and energy exchange chamber'20148,506,362'Polishing apparatus and polishing method'20138,506,363'Substrate holder and substrate holding method'20138,393,935'Polishing apparatus'20138,187,055'Polishing apparatus and polishing method'2012D0650344'Vacuum contact pad'2011D0649126'Vacuum contact pad'20118,047,896'Polishing apparatus, polishing method, and processing apparatus'20118,029,333'Device for polishing peripheral edge of semiconductor wafer'20117,976,361'Polishing apparatus and polishing method'20117,744,445'Polishing apparatus and polishing method'2010D0616389'Vacuum contact pad'2010RE039262'Polishing apparatus including turntable with polishing surface of different heights'20066,889,730'Hydraulic drive system'20056,659,121'Solenoid and hydraulic control valve'20036,648,014'Fluid control valve and plate with filter'20036,453,773'Elevation and index apparatus of water hydraulic driven type'20026,102,786'Polishing apparatus including turntable with polishing surface of different heights'20005,985,090'Polishing cloth and polishing apparatus having such polishing cloth'19995,944,042'Flow force compensating method and flow control valve of spool type using the same method'19995,888,126'Polishing apparatus including turntable with polishing surface of different heights'19995,882,244'Polishing apparatus'19995,846,335'Method for cleaning workpiece'19985,830,041'Method and apparatus for determining endpoint during a polishing process'19985,785,087'Water hydraulic proportional control valve'19985,704,827'Polishing apparatus including cloth cartridge connected to turntable'19985,679,064'Polishing apparatus including detachable cloth cartridge'19975,672,091'Polishing apparatus having endpoint detection device'19975,651,725'Apparatus and method for polishing workpiece'19975,639,388'Polishing endpoint detection method'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2020Patents assigned to EBARA CORP (48)· patent assignee history
1997–2006Based in Yamato, JP· patent location history
1998–2013Patents assigned to TOSHIBA KK (4)· patent assignee history
1998–2020Based in Tokyo, JP· patent location history
1998Based in Tanashi, JP· patent location history
1999Based in Kanagawa, JP· patent location history
2010–2011Based in Saitama-shi, JP· patent location history
2011–2016Patents assigned to TAKAHASHI TAMAMI (11)· patent assignee history
2012–2016Patents assigned to SEKI MASAYA (7)· patent assignee history
2012–2015Patents assigned to KUSA HIROAKI (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 48 | 1997–2020 |
| TAKAHASHI TAMAMIself | 11 | 2011–2016 |
| SEKI MASAYA | 7 | 2012–2016 |
| KUSA HIROAKI | 5 | 2012–2015 |
| TOSHIBA KK | 4 | 1998–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 33 | 1998–2020 |
| Yamato, JP | 10 | 1997–2006 |
| Saitama-shi, JP | 3 | 2010–2011 |
| Kanagawa, JP | 1 | 1999 |
| Tanashi, JP | 1 | 1998 |