Inventor

Gregor Kron

Inventor

Stuttgart, DE

Overview

2010–2011

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B81Cprimary

B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems13%

B82YSpecific uses or applications of nanostructures13%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry7%

B01LChemical or physical laboratory apparatus for general use7%

B05CApparatus for applying fluent materials to surfaces, in general7%

B41DApparatus for the mechanical reproduction of printing surfaces for stereotype printing7%

B41KStamps7%

B41MPrinting, duplicating, marking, or copying processes7%

H05KPrinted circuits7%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2010–2011Patents assigned to SONY DEUTSCHLAND GMBH (2)· patent assignee history

2010–2011Based in Stuttgart, DE· patent location history

2011Patents assigned to KRON GREGOR (1)· patent assignee history

2011Patents assigned to WESSELS JURINA (1)· patent assignee history

2011Patents assigned to YASUDA AKIO (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Stuttgart, DE	2	2010–2011