Inventor

Michiel David Nijkerk

Inventor
Amsterdam, NL

Overview

9→
Patents
2008–2016
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G02BOptical elements, systems or apparatus17%
G21KHandling of particles or ionising radiation not otherwise provided for17%
B82YSpecific uses or applications of nanostructures11%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light6%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
H01JElectric discharge tubes or discharge lamps6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008–2013Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2008–2013Based in Amsterdam, NL· patent location history
2009–2010Patents assigned to ZEISS CARL SMT AG (2)· patent assignee history
2010–2016Patents assigned to TNO (3)· patent assignee history
2012–2016Patents assigned to NIJKERK MICHIEL DAVID (3)· patent assignee history
2013–2016Patents assigned to KRUIZINGA BORGERT (2)· patent assignee history
2016Based in Delft, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV42008–2013
NIJKERK MICHIEL DAVIDself32012–2016
TNO32010–2016
KRUIZINGA BORGERT22013–2016
ZEISS CARL SMT AG22009–2010
Locations
LocationPatentsSpan
Amsterdam, NL72008–2013
Delft, NL22016