Inventor
Oliver Dier
Inventor
Lauchheim, DE
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
G21KHandling of particles or ionising radiation not otherwise provided for27%
G02BOptical elements, systems or apparatus23%
B82YSpecific uses or applications of nanostructures8%
G01BMeasuring length, thickness or similar linear dimensions4%
G01KMeasuring temperature4%
G01MTesting static or dynamic balance of machines or structures4%
H05GX-ray technique4%
PatentTitleYear
10,520,827Optical system, in particular for a microlithographic projection exposure apparatus201910,331,048Mirror, in particular for a microlithographic projection exposure apparatus201910,203,435EUV mirror and optical system comprising EUV mirror201910,161,808Method and arrangement for determining the heating condition of a mirror in an optical system20189,997,268EUV-mirror, optical system with EUV-mirror and associated operating method20189,921,483'Surface correction of mirrors with decoupling coating'20189,915,873'Reflective optical element, and optical system of a microlithographic projection exposure apparatus'20189,442,383'EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2019Patents assigned to ZEISS CARL SMT GMBH (8)· patent assignee history
2016–2019Based in Lauchheim, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 8 | 2016–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Lauchheim, DE | 8 | 2016–2019 |