Inventor
Katsutoshi Machida
Inventor
Kanagawa, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Cprimary
C07CAcyclic or carbocyclic compounds27%
C09KMaterials for miscellaneous applications, not provided for elsewhere27%
C07DHeterocyclic compounds20%
G03CPhotosensitive materials for photographic purposes13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
PatentTitleYear
5,914,071'Difluoroethylene compounds and liquid crystal compositions containing them'19995,663,463'Difluoroethylene compounds and liquid crystal compositions containing them'19975,516,949'Difluoroethylene compounds and liquid crystal compositions containing them'19965,380,461'Trans-dihalogenostilbene compounds and liquid crystal electro-optical devices using them'19954,731,322'Light-sensitive silver halide photographic material for X-ray photography'19884,639,417'Silver halide X-ray photosensitive material'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987–1988Patents assigned to KONISHIROKU PHOTO IND (2)· patent assignee history
1987Based in Hachioji, JP· patent location history
1988Based in Hino, JP· patent location history
1995–1999Patents assigned to SEIMI CHEM KK (4)· patent assignee history
1995–1999Based in Kanagawa, JP· patent location history
1996–1999Patents assigned to ASAHI GLASS CO LTD (3)· patent assignee history
1996–1997Based in Samukawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIMI CHEM KK | 4 | 1995–1999 |
| ASAHI GLASS CO LTD | 3 | 1996–1999 |
| KONISHIROKU PHOTO IND | 2 | 1987–1988 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 2 | 1995–1999 |
| Samukawa, JP | 2 | 1996–1997 |
| Hino, JP | 1 | 1988 |
| Hachioji, JP | 1 | 1987 |