Inventor
Gyeong S. Hwang
Inventor
Austin, TX, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Fprimary
G06FElectric digital data processing67%
G16CComputational chemistry17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
8,036,864'Method for predicting the formation of silicon nanocrystals in embedded oxide matrices'20117,756,687'Method for predicting contributions of silicon interstitials to n-type dopant transient enhanced diffusion during a pn junction formation'20107,074,270'Method for predicting the behavior of dopant and defect components'20066,685,772'De novo processing of electronic materials'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2006Patents assigned to CALIFORNIA INST OF TECHN (2)· patent assignee history
2004–2011Based in Austin, TX, US· patent location history
2010Patents assigned to HARRISON SCOTT A (1)· patent assignee history
2010Patents assigned to HWANG GYEONG S (1)· patent assignee history
2011Patents assigned to UNIV TEXAS (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CALIFORNIA INST OF TECHN | 2 | 2004–2006 |
| HARRISON SCOTT A | 1 | 2010 |
| HWANG GYEONG Sself | 1 | 2010 |
| UNIV TEXAS | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 4 | 2004–2011 |