Inventor

Manoj Vellaikal

Inventor

Sunnyvale, CA, US

Overview

2002–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%

C23CCoating metallic material21%

H01JElectric discharge tubes or discharge lamps19%

H01LSemiconductor devices12%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%

C03CChemical composition of glasses, glazes or vitreous enamels2%

PatentTitleYear

11,087,979Cleaning method2021 10,199,221Cleaning method2019 9,870,921'Cleaning method'2018 8,927,400'Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafers'2015 8,642,128'Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber walls'2014 8,501,605'Methods and apparatus for conformal doping'2013 8,492,177'Methods for quantitative measurement of a plasma immersion process'2013 8,003,500'Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking'2011 7,867,921'Reduction of etch-rate drift in HDP processes'2011 7,745,350'Impurity control in HDP-CVD DEP/ETCH/DEP processes'2010 7,659,184'Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking'2010 7,628,897'Reactive ion etching for semiconductor device feature topography modification'2009 7,329,586'Gapfill using deposition-etch sequence'2008 7,229,931'Oxygen plasma treatment for enhanced HDP-CVD gapfill'2007 7,205,240'HDP-CVD multistep gapfill process'2007 6,803,325'Apparatus for improving barrier layer adhesion to HDP-FSG thin films'2004 6,413,871'Nitrogen treatment of polished halogen-doped silicon glass'2002 6,410,457'Method for improving barrier layer adhesion to HDP-FSG thin films'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2021Patents assigned to APPLIED MATERIALS INC (18)· patent assignee history

2002–2009Based in Santa Clara, CA, US· patent location history

2010–2021Based in Sunnyvale, CA, US· patent location history

2013–2014Patents assigned to VELLAIKAL MANOJ (3)· patent assignee history

2013Patents assigned to HILKENE MARTIN A (2)· patent assignee history

2013Patents assigned to PORSHNEV PETER I (2)· patent assignee history

2013Patents assigned to SCOTNEY-CASTLE MATTHEW D (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
APPLIED MATERIALS INC	18	2002–2021
VELLAIKAL MANOJself	3	2013–2014
HILKENE MARTIN A	2	2013
PORSHNEV PETER I	2	2013
SCOTNEY-CASTLE MATTHEW D	2	2013

Locations

Location	Patents	Span
Sunnyvale, California, US	11	2010–2021
Santa Clara, California, US	7	2002–2009