Inventor
Michael Mühlbeyer
Inventor
Aalen, DE
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
PatentTitleYear
7,710,542'Imaging device in a projection exposure machine'20107,603,010'Device consisting of at least one optical element'20096,867,913'6-mirror microlithography projection objective'20056,844,994'Optical element deformation system'20056,750,949'Lithographic apparatus and device manufacturing method'20046,191,898'Optical imaging device, particularly an objective, with at least one optical element'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001Patents assigned to ZEISS STIFTUNG (1)· patent assignee history
2001–2010Based in Aalen, DE· patent location history
2004–2010Patents assigned to ZEISS CARL SMT AG (5)· patent assignee history
2004Patents assigned to AMSL NETHERLANDS BV (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT AG | 5 | 2004–2010 |
| AMSL NETHERLANDS BV | 1 | 2004 |
| ZEISS STIFTUNG | 1 | 2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 6 | 2001–2010 |