Inventor
Yasuyuki Unno
Inventor
Tochigi, JP
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G02BOptical elements, systems or apparatus22%
G01MTesting static or dynamic balance of machines or structures5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
G03HHolographic processes or apparatus5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
C30BSingle-crystal growth3%
G01BMeasuring length, thickness or similar linear dimensions3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
10,777,440Detection device, imprint apparatus, planarization device, detection method, and article manufacturing method20209,360,423'Optical system for a holographic microscope including a spatial filter'20169,347,853'Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium'20169,170,171'Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium'20159,116,303'Hologram with cells to control phase in two polarization directions and exposure apparatus'20159,091,614'Wavefront optical measuring apparatus'20158,896,840'Interferometric method and digital holographic microscope'20148,531,747'Hologram, hologram data generation method, and exposure apparatus'20138,432,530'Device, method, and system for measuring image profiles produced by an optical lithography system'20138,314,938'Method and apparatus for measuring surface profile of an object'20127,911,709'Apparatus and method for improving detected resolution and/or intensity of a sampled image'20117,508,598'Apparatus for measuring aerial images produced by an optical lithography system'20097,262,920'Optical element and manufacturing method therefor'20077,102,828'Optical element and manufacturing method thereof'20066,829,041'Projection optical system and projection exposure apparatus having the same'20046,641,985'Method for making element'20036,476,869'Image processing system and method using system characteristic and image information'20026,327,086'Optical diffraction device and exposure apparatus'20016,301,001'Optical element manufacturing system, an illumination system, and an exposure apparatus'20016,120,950'Optical element manufacturing method'20006,077,631'Photomask and scanning exposure apparatus and device manufacturing method using same'20005,995,285'Multilevel optical diffraction device with antireflection film and exposure apparatus'19995,953,106'Projection optical system, exposure apparatus and semiconductor-device manufacturing method using the system'19995,933,219'Projection exposure apparatus and device manufacturing method capable of controlling polarization direction'19995,872,617'Scanning type exposure apparatus and device manufacturing method'19995,805,273'Projection exposure apparatus and microdevice manufacturing method'19985,706,077'Scan type projection exposure apparatus and microdevice manufacturing method using the same'19985,459,000'Image projection method and device manufacturing method using the image projection method'19955,184,176'Projection exposure apparatus with an aberration compensation device of a projection lens'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2020Patents assigned to CANON KK (29)· patent assignee history
1998–2016Based in Tochigi, JP· patent location history
1998–2003Based in Minamikawachi-gun, JP· patent location history
2009–2013Based in Irvine, CA, US· patent location history
2012–2016Patents assigned to UNNO YASUYUKI (7)· patent assignee history
2012–2015Patents assigned to OHKUBO AKINORI (2)· patent assignee history
2012–2015Based in Tucson, AZ, US· patent location history
2013–2016Patents assigned to MATSUBARA ISAO (4)· patent assignee history
2013–2015Patents assigned to DALLAS WILLIAM (3)· patent assignee history
2014–2020Based in Utsunomiya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 29 | 1993–2020 |
| UNNO YASUYUKIself | 7 | 2012–2016 |
| MATSUBARA ISAO | 4 | 2013–2016 |
| DALLAS WILLIAM | 3 | 2013–2015 |
| OHKUBO AKINORI | 2 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tochigi, JP | 8 | 1998–2016 |
| Minamikawachi-gun, JP | 6 | 1998–2003 |
| Utsunomiya, JP | 5 | 2014–2020 |
| Tucson, AZ, US | 3 | 2012–2015 |
| Irvine, California, US | 3 | 2009–2013 |