Inventor
Eiichi Sekimoto
Inventor
Koshi, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1047%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
B05DProcesses for applying fluent materials to surfaces, in general11%
H01LSemiconductor devices11%
H05BElectric heating5%
PatentTitleYear
11,087,983Thermal treatment apparatus, thermal treatment method, and non-transitory computer storage medium202110,504,757Substrate processing apparatus and method of adjusting substrate processing apparatus20197,868,270'Temperature control for performing heat process in coating/developing system for resist film'20117,755,003'Temperature control for performing heat process on resist film'20107,517,217'Method and apparatus for heat processing of substrate'20096,969,538'Method for heat processing of substrate'20056,659,661'Substrate processing apparatus'20036,573,031'Apparatus and method of thermal processing and method of pattern formation'20036,185,370'Heating apparatus for heating an object to be processed'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2021Patents assigned to TOKYO ELECTRON LTD (9)· patent assignee history
2001–2009Based in Kumamoto, JP· patent location history
2003Based in Kikuchi-gun, JP· patent location history
2003Based in Suwa, JP· patent location history
2010–2021Based in Koshi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 9 | 2001–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 4 | 2010–2021 |
| Kumamoto, JP | 3 | 2001–2009 |
| Kikuchi-gun, JP | 1 | 2003 |
| Suwa, JP | 1 | 2003 |