Inventor
Manuj Nahar
Inventor
Boise, ID, US
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices23%
H10DInorganic electric semiconductor devices23%
H10BElectronic memory devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
H01GCapacitors5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
C23CCoating metallic material2%
C30BSingle-crystal growth2%
G11CStatic stores2%
PatentTitleYear
11,018,229Methods of forming semiconductor structures202110,964,811Transistor and methods of forming transistors202110,950,384Method used in forming an electronic device comprising conductive material and ferroelectric material202110,923,593Transistor and methods of forming transistors202110,886,130Methods of forming crystalline semiconductor material, and methods of forming transistors202110,748,914Ferroelectric capacitor, ferroelectric field effect transistor, and method used in forming an electronic component comprising conductive material and ferroelectric material202010,707,298Methods of forming semiconductor structures202010,650,978Methods of incorporating leaker devices into capacitor configurations to reduce cell disturb202010,553,673Methods used in forming at least a portion of at least one conductive capacitor electrode of a capacitor that comprises a pair of conductive capacitor electrodes having a capacitor insulator there-between and methods of forming a capacitor20209,876,018Ferroelectric capacitor, ferroelectric field effect transistor, and method used in forming an electronic component comprising conductive material and ferroelectric material2018Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2018–2021Patents assigned to MICRON TECHNOLOGY INC (10)· patent assignee history
2018–2021Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 10 | 2018–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 10 | 2018–2021 |