Inventor
Shawming Ma
Inventor
Sunnyvale, CA, US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1016%
H01JElectric discharge tubes or discharge lamps12%
H01LSemiconductor devices9%
H10DInorganic electric semiconductor devices9%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation9%
H10BElectronic memory devices5%
B08BCleaning in general3%
B41JTypewriters3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
PatentTitleYear
10,790,119Plasma processing apparatus with post plasma gas injection202010,599,039Strip process for high aspect ratio structure202010,580,661Atomic layer etch process using plasma in conjunction with a rapid thermal activation process202010,573,532Method for processing a workpiece using a multi-cycle thermal treatment process202010,078,266Implanted photoresist stripping process20188,133,819'Plasma etching carbonaceous layers with sulfur-based etchants'20128,048,806'Methods to avoid unstable plasma states during a process transition'20117,838,432'Etch process with controlled critical dimension shrink'20107,510,976'Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity'20097,432,210'Process to open carbon based hardmask'20086,812,145'Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures'20046,806,101'Ferroelectric capacitor plasma charging monitor'20046,673,636'Method of real-time plasma charging voltage measurement on powered electrode with electrostatic chuck in plasma process chambers'20046,613,666'Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures'20036,614,051'Device for monitoring substrate charging and method of fabricating same'20036,576,922'Ferroelectric capacitor plasma charging monitor'20036,554,954'Conductive collar surrounding semiconductor workpiece in plasma chamber'20036,548,343'Method of fabricating a ferroelectric memory cell'20036,485,988'Hydrogen-free contact etch for ferroelectric capacitor formation'20026,396,118'Conductive mesh bias connection for an array of elevated active pixel sensors'20026,281,535'Three-dimensional ferroelectric capacitor structure for nonvolatile random access memory cell'20016,270,192'Monolithic ink jet nozzle formed from an oxide and nitride composition'20016,215,164'Elevated image sensor array which includes isolation between uniquely shaped image sensors'20016,154,234'Monolithic ink jet nozzle formed from an oxide and nitride composition'20006,114,739'Elevated pin diode active pixel sensor which includes a patterned doped semiconductor electrode'20006,018,187'Elevated pin diode active pixel sensor including a unique interconnection structure'20005,936,261'Elevated image sensor array which includes isolation between the image sensors and a unique interconnection'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2020Based in Sunnyvale, CA, US· patent location history
2000–2004Patents assigned to AGILENT TECHNOLOGIES INC (8)· patent assignee history
2002–2004Patents assigned to TEXAS INSTRUMENTS INC (4)· patent assignee history
2003–2012Patents assigned to APPLIED MATERIALS INC (8)· patent assignee history
2018–2020Patents assigned to MATTSON TECH INC (5)· patent assignee history
2020Patents assigned to BEIJING E TOWN SEMICONDUCTOR TECH CO LTD (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGILENT TECHNOLOGIES INC | 8 | 2000–2004 |
| APPLIED MATERIALS INC | 8 | 2003–2012 |
| MATTSON TECH INC | 5 | 2018–2020 |
| BEIJING E TOWN SEMICONDUCTOR TECH CO LTD | 4 | 2020 |
| TEXAS INSTRUMENTS INC | 4 | 2002–2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 27 | 1999–2020 |