Inventor
Kiyohiro Matsushita
Inventor
Tama, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
C23CCoating metallic material25%
H01LSemiconductor devices16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B08BCleaning in general3%
F17DPipe-line systems3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
9,478,414'Method for hydrophobization of surface of silicon-containing film by ALD'20169,190,263'Method for forming SiOCH film using organoaminosilane annealing'20159,136,108'Method for restoring porous surface of dielectric layer by UV light-assisted ALD'20159,029,272'Method for treating SiOCH film with hydrogen plasma'20158,785,215'Method for repairing damage of dielectric film by cyclic processes'20148,664,627'Method for supplying gas with flow rate gradient over substrate'20148,241,991'Method for forming interconnect structure having airgap'20127,807,566'Method for forming dielectric SiOCH film having chemical stability'20107,789,965'Method of cleaning UV irradiation chamber'20107,763,869'UV light irradiating apparatus with liquid filter'20107,718,544'Method of forming silicon-containing insulation film having low dielectric constant and low diffusion coefficient'20107,501,292'Method for managing UV irradiation for curing semiconductor substrate'20097,354,852'Method of forming interconnection in semiconductor device'20086,818,570'Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2012Patents assigned to ASM JAPAN (8)· patent assignee history
2004–2010Based in Tama, JP· patent location history
2012–2014Patents assigned to MATSUSHITA KIYOHIRO (2)· patent assignee history
2012Patents assigned to FUKAZAWA ATSUKI (1)· patent assignee history
2012Patents assigned to HSIEH JULIAN J (1)· patent assignee history
2012–2016Based in Fuchu, JP· patent location history
2014–2016Patents assigned to ASM IP HOLDING BV (6)· patent assignee history
2014Based in Hachioji, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM JAPAN | 8 | 2004–2012 |
| ASM IP HOLDING BV | 6 | 2014–2016 |
| MATSUSHITA KIYOHIROself | 2 | 2012–2014 |
| FUKAZAWA ATSUKI | 1 | 2012 |
| HSIEH JULIAN J | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tama, JP | 7 | 2004–2010 |
| Fuchu, JP | 6 | 2012–2016 |
| Hachioji, JP | 1 | 2014 |