Inventor
Yung-Mao Hsu
Inventor
Tainan, TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps29%
B08BCleaning in general14%
C23CCoating metallic material14%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light14%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
G05DSystems for controlling or regulating non-electric variables14%
PatentTitleYear
7,354,555'Gas flow control system with interlock'20086,815,653'Method and apparatus for early detection of material accretion and peeling in plasma system'20045,851,343'Protective shield around the inner edge of endpoint window in a plasma etching chamber'19985,697,839'Ventilation hood for wet-clean process chamber'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2008Patents assigned to TAIWAN SEMICONDUCTOR MFG (4)· patent assignee history
1997–1998Based in Hsinchu, TW· patent location history
2004–2008Based in Tainan, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 4 | 1997–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tainan, TW | 2 | 2004–2008 |
| Hsinchu, TW | 2 | 1997–1998 |