Inventor
Masashi Omori
Inventor
Shizuoka, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
F26BDrying solid materials or objects by removing liquid therefrom25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
B08BCleaning in general13%
PatentTitleYear
6,616,774'Wafer cleaning device and tray for use in wafer cleaning device'20036,432,218'Multi-step flow cleaning method and multi-step flow cleaning apparatus'20025,709,037'Stream drying process'19985,608,974'Steam drying apparatus, cleaning apparatus incorporating the same, and steam drying process'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–1998Patents assigned to MITSUBISHI ELECTRIC CORP (2)· patent assignee history
1997–1998Patents assigned to RYODEN SEMICONDUCTOR SYST ENG (2)· patent assignee history
1997–1998Based in Hyogo, JP· patent location history
2002Patents assigned to SHIMADA RIKA KOGYO KK (1)· patent assignee history
2002–2003Based in Shizuoka, JP· patent location history
2003Patents assigned to SPC ELECTRONICS (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 2 | 1997–1998 |
| RYODEN SEMICONDUCTOR SYST ENG | 2 | 1997–1998 |
| SHIMADA RIKA KOGYO KK | 1 | 2002 |
| SPC ELECTRONICS | 1 | 2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 2 | 2002–2003 |
| Hyogo, JP | 2 | 1997–1998 |