Inventor

Semyon Sherstinsky

Inventor
San Francisco, CA, US

Overview

29→
Patents
1986–2011
Patent span
Electricity
Primary field (CPC H)

Patents· 29 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1041%
C23CCoating metallic material13%
H01JElectric discharge tubes or discharge lamps12%
H02NElectric machines not otherwise provided for12%
Y10TTechnical subjects covered by former us classification12%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling1%
C30BSingle-crystal growth1%
G11BInformation storage based on relative movement between record carrier and transducer1%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h101%
PatentTitleYear
7,907,384'Detachable electrostatic chuck for supporting a substrate in a process chamber'20117,697,260'Detachable electrostatic chuck'20107,480,129'Detachable electrostatic chuck for supporting a substrate in a process chamber'20097,252,737'Pedestal with integral shield'20077,244,344'Physical vapor deposition plasma reactor with VHF source power applied through the workpiece'20076,837,968'Lower pedestal shield'20056,726,805'Pedestal with integral shield'20046,652,713'Pedestal with integral shield'20036,557,248'Method of fabricating an electrostatic chuck'20036,464,790'Substrate support member'20026,464,795'Substrate support member for a processing chamber'20026,350,320'Heater for processing chamber'20026,278,600'Electrostatic chuck with improved temperature control and puncture resistance'20016,270,621'Etch chamber'20016,248,176'Apparatus and method for delivering a gas'20016,123,864'Etch chamber'20005,985,033'Apparatus and method for delivering a gas'19995,883,778'Electrostatic chuck with fluid flow regulator'19995,753,132'Method of making electrostatic chuck with conformal insulator film'19985,745,331'Electrostatic chuck with conformal insulator film'19985,740,009'Apparatus for improving wafer and chuck edge protection'19985,673,922'Apparatus for centering substrates on support members'19975,671,117'Electrostatic chuck'19975,634,266'Method of making a dielectric chuck'19975,421,401'Compound clamp ring for semiconductor wafers'19955,326,725'Clamping ring and susceptor therefor'19945,316,278'Clamping ring apparatus for processing semiconductor wafers'19945,292,399'Plasma etching apparatus with conductive means for inhibiting arcing'19944,627,288'Bearing unloading mechanism for disc clamping unit'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986Patents assigned to GUZIK TECHNICAL ENTERPRISES (1)· patent assignee history
1986–2011Based in San Francisco, CA, US· patent location history
1994–2011Patents assigned to APPLIED MATERIALS INC (28)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC281994–2011
GUZIK TECHNICAL ENTERPRISES11986
Locations
LocationPatentsSpan
San Francisco, California, US291986–2011