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Inventor

SATOSHI IWATANI

Inventor
JP

Overview

3→
Patents
2023–2025
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
B29CShaping or joining of plastics10%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems10%
G01BMeasuring length, thickness or similar linear dimensions10%
G02BOptical elements, systems or apparatus10%
H01LSemiconductor devices10%
PatentTitleYear
12,386,274Stage device, lithography apparatus, and article manufacturing method202512,044,962Forming apparatus, forming method, and article manufacturing method202411,543,745Stage driving apparatus, lithography apparatus, and method of manufacturing article2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to CANON KK (3)· patent assignee history
2023–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK32023–2025
Locations
LocationPatentsSpan
JP32023–2025