Inventor
Wendy H. Yeh
Inventor
Mountain View, CA, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1037%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C23CCoating metallic material11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
C03CChemical composition of glasses, glazes or vitreous enamels4%
H01QAntennas, i.e. radio aerials4%
H04BTransmission4%
H04WWireless communication networks4%
PatentTitleYear
10,944,159Combination external vehicle antenna housing and installation method20218,125,034'Graded ARC for high NA and immersion lithography'20127,776,516'Graded ARC for high NA and immersion lithography'20107,737,040'Method of reducing critical dimension bias during fabrication of a semiconductor device'20107,718,081'Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes'20107,642,195'Hydrogen treatment to improve photoresist adhesion and rework consistency'20107,407,893'Liquid precursors for the CVD deposition of amorphous carbon films'20087,365,014'Reticle fabrication using a removable hard mask'20087,262,106'Absorber layer for DSA processing'20077,109,087'Absorber layer for DSA processing'20067,105,442'Ashable layers for reducing critical dimensions of integrated circuit features'20067,094,442'Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon'20067,064,078'Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme'20066,853,043'Nitrogen-free antireflective coating for use with photolithographic patterning'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2012Patents assigned to APPLIED MATERIALS INC (13)· patent assignee history
2005–2012Based in Mountain View, CA, US· patent location history
2012Patents assigned to LEE KWANGDUK DOUGLAS (1)· patent assignee history
2012Patents assigned to RATHI SUDHA (1)· patent assignee history
2012Patents assigned to SEAMONS MARTIN J (1)· patent assignee history
2021Patents assigned to MAGNADYNE CORP (1)· patent assignee history
2021Based in Torrance, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 13 | 2005–2012 |
| LEE KWANGDUK DOUGLAS | 1 | 2012 |
| MAGNADYNE CORP | 1 | 2021 |
| RATHI SUDHA | 1 | 2012 |
| SEAMONS MARTIN J | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mountain View, California, US | 13 | 2005–2012 |
| Torrance, California, US | 1 | 2021 |