LexDanaLexDanabeta
Inventor

Ryo Nonaka

Inventor
Yamanashi, JP

Overview

17→
Patents
1994–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H01JElectric discharge tubes or discharge lamps18%
B05DProcesses for applying fluent materials to surfaces, in general9%
H01LSemiconductor devices9%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form6%
F21SNon-portable lighting devices6%
F21VFunctional features or details of lighting devices or systems thereof6%
F21YIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to the form or the kind of the light sources or of the colour of the light emitted3%
G02BOptical elements, systems or apparatus3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
PatentTitleYear
11,022,842Planar light source device and display device202110,899,118Multilayer coating film and coated article202110,882,074Multilayer coating film and coated article202110,418,258Mounting table temperature control device and substrate processing apparatus201910,408,417Light-emitting device with light flux control member having prismatic elements on bottom surface forming acute angle with side edge of light source2019D0778334'Lens for light emitting diode'20179,330,891'Plasma processing method and plasma processing apparatus'20168,950,469'Temperature control system and temperature control method for substrate mounting table'20158,132,580'Substrate processing system and substrate cleaning apparatus including a jetting apparatus'20127,988,062'Temperature control device for target substrate, temperature control method and plasma processing apparatus including same'20117,230,202'Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod'20077,005,660'Surface processing apparatus'20066,492,612'Plasma apparatus and lower electrode thereof'20026,074,518'Plasma processing apparatus'20005,997,962'Plasma process utilizing an electrostatic chuck'19995,914,568'Plasma processing apparatus'19995,310,453'Plasma process method using an electrostatic chuck'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2000Patents assigned to TEL YAMANISHI KK (2)· patent assignee history
1994–2015Based in Yamanashi, JP· patent location history
1999–2019Patents assigned to TOKYO ELECTRON LTD (11)· patent assignee history
2006–2012Based in Nirasaki, JP· patent location history
2012–2019Patents assigned to NONAKA RYO (3)· patent assignee history
2016–2019Based in Miyagi, JP· patent location history
2017–2021Patents assigned to ENPLAS CORP (3)· patent assignee history
2019–2021Based in Saitama, JP· patent location history
2021Patents assigned to MAZDA MOTOR (2)· patent assignee history
2021Based in Hiroshima, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD111999–2019
ENPLAS CORP32017–2021
NONAKA RYOself32012–2019
MAZDA MOTOR22021
TEL YAMANISHI KK21994–2000
Locations
LocationPatentsSpan
Yamanashi, JP51994–2015
Nirasaki, JP42006–2012
Saitama, JP22019–2021
Hiroshima, JP22021
Miyagi, JP22016–2019