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Inventor

Hong Joo Lim

Inventor
Pyungtaek, KR

Overview

3→
Patents
1998–2007
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material40%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
H10DInorganic electric semiconductor devices20%
PatentTitleYear
7,163,719'Method of depositing thin film using hafnium compound'20076,884,297'Thin film deposition reactor'20055,751,017'Thin film transistor having double gate insulating layer'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998Patents assigned to LG ELECTRONICS INC (1)· patent assignee history
1998Based in Seoul, KR· patent location history
2005–2007Patents assigned to IPS LTD (2)· patent assignee history
2005–2007Based in Pyungtaek, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IPS LTD22005–2007
LG ELECTRONICS INC11998
Locations
LocationPatentsSpan
Pyungtaek, KR22005–2007
Seoul, KR11998