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Inventor

Akira Sumitani

Inventor
Isehara, JP

Overview

26→
Patents
1998–2020
Patent span
Physics
Primary field (CPC G)

Patents· 26 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H05Gprimary
H05GX-ray technique27%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
G21KHandling of particles or ionising radiation not otherwise provided for13%
B82YSpecific uses or applications of nanostructures5%
F02FCylinders, pistons or casings, for combustion engines5%
F16CShafts5%
F16FSprings5%
F16JPistons5%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light5%
G02BOptical elements, systems or apparatus3%
PatentTitleYear
10,760,636Engine reciprocative rotating mechanism and method for manufacturing the same202010,612,615Engine reciprocative rotating mechanism and method for manufacturing the same20209,926,998'Piston structure for engine'20188,804,902'Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus'20148,710,475'Extreme ultraviolet light source device and method for generating extreme ultraviolet light'20148,698,116'Extreme ultra violet light source apparatus'20148,536,551'Extreme ultra violet light source apparatus'20138,507,883'Extreme ultraviolet light source apparatus'20138,492,738'Apparatus for and method of withdrawing ions in EUV light production apparatus'20138,481,984'Extreme ultra violet light source apparatus'20138,477,412'Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus'20138,471,226'Extreme ultraviolet light source device and method for producing extreme ultraviolet light'20138,354,657'Extreme ultra violet light source apparatus'20138,294,129'Extreme ultraviolet light source apparatus'20128,288,743'Apparatus for and method of withdrawing ions in EUV light production apparatus'20128,256,441'Method for cleaning optical element of EUV light source device and optical element cleaning device'20128,173,984'Extreme ultraviolet light source apparatus'20127,928,418'Extreme ultra violet light source apparatus'20117,923,705'Extreme ultra violet light source apparatus'20117,915,600'Extreme ultra violet light source apparatus'20117,880,153'Extreme ultra violet light source apparatus'20117,683,355'Extreme ultra violet light source apparatus'20107,006,548'Excimer laser device and gas for excimer laser'20066,810,061'Discharge electrode and discharge electrode manufacturing method'20046,496,527'Ultraviolet laser apparatus and gas for ultraviolet laser'20025,811,051'Method and apparatus for continuously draw-molding fiber reinforced plastic rod formed with spiral groove'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2012Patents assigned to KOMATSU MFG CO LTD (8)· patent assignee history
1998Based in Kanagawa, JP· patent location history
2002–2014Based in Isehara, JP· patent location history
2004–2014Patents assigned to GIGAPHOTON INC (16)· patent assignee history
2011–2014Based in Hiratsuka, JP· patent location history
2012–2013Patents assigned to SUMITANI AKIRA (10)· patent assignee history
2012–2013Patents assigned to ABE TAMOTSU (8)· patent assignee history
2012–2013Patents assigned to WAKABAYASHI OSAMU (6)· patent assignee history
2012Based in Tokyo, JP· patent location history
2018–2020Based in Higashihiroshima, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
GIGAPHOTON INC162004–2014
SUMITANI AKIRAself102012–2013
ABE TAMOTSU82012–2013
KOMATSU MFG CO LTD81998–2012
WAKABAYASHI OSAMU62012–2013
Locations
LocationPatentsSpan
Isehara, JP122002–2014
Hiratsuka, JP92011–2014
Higashihiroshima, JP32018–2020
Tokyo, JP12012
Kanagawa, JP11998