Inventor

Mami Shirota

Inventor

Wakayama, JP

Overview

2001–2013

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%

C09GPolishing compositions12%

C09KMaterials for miscellaneous applications, not provided for elsewhere12%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%

B24BMachines, devices, or processes for grinding or polishing8%

C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals8%

C01GCompounds containing metals not covered by subclasses c01d or c01f8%

C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds8%

C11DDetergent compositions8%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2001–2013Patents assigned to KAO CORP (6)· patent assignee history

2001–2013Based in Wakayama, JP· patent location history

2011–2013Patents assigned to SHIROTA MAMI (2)· patent assignee history

2011–2013Patents assigned to YONEDA YASUHIRO (2)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Wakayama, JP	6	2001–2013