Inventor

Hajime Nakao

Inventor

Azumino, JP

Overview

2002–2020

Patent span

Chemistry

Primary field (CPC C)

Patents· 42 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Jprimary

B41JTypewriters31%

C10MLubricating compositions18%

C10NIndexing scheme associated with subclass c10m relating to lubricating compositions18%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein5%

H10NElectric solid-state devices not otherwise provided for3%

Y10TTechnical subjects covered by former us classification3%

B05BSpraying apparatus2%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%

PatentTitleYear

10,525,707Liquid ejecting head, liquid ejecting apparatus, and piezoelectric device2020 10,479,078Liquid ejecting head, liquid ejecting apparatus, and manufacturing method of liquid ejecting apparatus2019 10,227,541Lubricating oil composition for transmissions2019 9,701,117'Liquid-jet head and liquid-jet apparatus'2017 9,540,587'Lubricating oil composition for transmissions'2017 9,505,227'Liquid ejecting apparatus with water repellent region'2016 9,469,108'Liquid ejecting head and liquid ejecting apparatus'2016 9,387,674'Flow path unit and liquid ejecting apparatus equipped with flow path unit'2016 9,381,747'Flow path component, liquid ejecting apparatus, and method for manufacturing flow path component'2016 9,340,747'Lubricating oil composition for transmissions'2016 9,272,294'Liquid ejecting head and liquid ejecting apparatus'2016 9,248,649'Liquid ejecting head, liquid ejecting apparatus, and method of manufacturing liquid ejecting head'2016 9,242,463'Liquid-jet head and liquid-jet apparatus'2016 9,163,195'Lubricant composition'2015 9,156,261'Piezoelectric unit, liquid ejecting head, liquid ejecting apparatus and method of manufacturing piezoelectric unit'2015 9,150,018'Liquid ejecting head and liquid ejecting apparatus'2015 9,120,992'Gear oil composition'2015 9,056,476'Liquid ejecting apparatus'2015 9,022,526'Liquid ejecting head and liquid ejecting apparatus'2015 8,967,771'Liquid ejecting head, liquid ejecting apparatus and method for manufacturing liquid ejecting head'2015 8,833,916'Liquid ejecting head and liquid ejecting apparatus'2014 8,827,423'Liquid ejecting head and liquid ejecting apparatus'2014 8,740,354'Liquid ejecting head and liquid ejecting apparatus'2014 8,678,559'Liquid ejecting head and liquid ejecting apparatus'2014 8,672,458'Liquid ejecting head and liquid ejecting apparatus'2014 8,299,006'Compressor oil composition'2012 8,247,360'Heat treating oil composition'2012 8,236,740'Lubricating oil composition'2012 8,232,233'Lubricating oil composition for machine tools'2012 8,227,388'Hydraulic oil composition'2012 8,227,387'Metalworking oil composition'2012 8,193,129'Refrigerator oil, compressor oil composition, hydraulic fluid composition, metalworking fluid composition, heat treatment oil composition, lubricant composition for machine tool and lubricant composition'2012 8,189,157'Liquid crystal display device and process for manufacturing the same'2012 8,115,882'Liquid crystal display device and manufacturing method thereof'2012 8,023,088'Liquid crystal display device and manufacturing method of the liquid crystal display device'2011 7,880,495'Display device and test probe for testing display device'2011 7,338,740'Positive resist composition'2008 7,279,265'Positive resist composition and pattern formation method using the same'2007 7,214,733'Positive type resist composition'2007 7,214,465'Positive photosensitive composition'2007 6,692,897'Positive resist composition'2004 6,479,211'Positive photoresist composition for far ultraviolet exposure'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2008Based in Shizuoka, JP· patent location history

2011–2020Based in Azumino, JP· patent location history

2012–2016Patents assigned to NAKAO HAJIME (14)· patent assignee history

2012Patents assigned to AKIYAMA EIJI (7)· patent assignee history

2012Patents assigned to HATA MASAHIRO (7)· patent assignee history

2012Patents assigned to HOSHINO HIROYUKI (7)· patent assignee history

2012–2015Based in Yokohama, JP· patent location history

2014–2020Patents assigned to SEIKO EPSON CORP (20)· patent assignee history

2015–2019Based in Tokyo, JP· patent location history

2016Based in Otawara-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SEIKO EPSON CORP	20	2014–2020
NAKAO HAJIMEself	14	2012–2016
AKIYAMA EIJI	7	2012
HATA MASAHIRO	7	2012
HOSHINO HIROYUKI	7	2012

Locations

Location	Patents	Span
Azumino, JP	21	2011–2020
Yokohama, JP	8	2012–2015
Shizuoka, JP	6	2002–2008
Tokyo, JP	4	2015–2019
Otawara-shi, JP	1	2016