Inventor
WEI-YIP LOH
Inventor
TW
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices28%
H01LSemiconductor devices25%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1024%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H01QAntennas, i.e. radio aerials2%
H04BTransmission2%
B82YSpecific uses or applications of nanostructures1%
PatentTitleYear
12,532,721Barrier-free approach for forming contact plugs202612,501,657Selective silicide for stacked multi-gate device202512,439,625Semiconductor device structure and method for forming the same202512,433,006Semiconductor device with conductive liners over silicide structures and method of making the semiconductor device202512,328,890Contact with a silicide region202512,327,788Gate to source drain interconnects202512,300,496Deposition window enlargement202512,300,542Semiconductor device pre-cleaning202512,300,900Ammonium fluoride pre-clean protection202512,272,621Buried conductive structure in semiconductor substrate202512,218,012Method of manufacturing semiconductor devices with multiple silicide regions202512,166,078Contact structure for semiconductor device and method202412,087,642Selective dual silicide formation202412,046,510Conductive feature formation and structure202412,009,200Treatment for adhesion improvement202411,915,976Semiconductor device pre-cleaning202411,901,229Barrier-free approach for forming contact plugs202411,810,826Semiconductor devices with stacked silicide regions202311,742,210Deposition window enlargement202311,676,868Selective dual silicide formation202311,594,410Treatment for adhesion improvement202311,411,094Contact with a silicide region202211,373,905Semiconductor device pre-cleaning202211,348,839Method of manufacturing semiconductor devices with multiple silicide regions202211,342,225Barrier-free approach for forming contact plugs202211,335,774Contact structure for semiconductor device and method202211,232,947Ammonium fluoride pre-clean protection202211,195,791Method for forming semiconductor contact structure202111,177,172Semiconductor structure2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (29)· patent assignee history
2021–2026Based in TW· patent location history
2022Based in SG· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 29 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 27 | 2021–2026 |
| SG | 2 | 2022 |