Inventor

Shin-ichiro Iwanaga

Inventor

Yokkaichi, JP

Overview

1986–2009

Patent span

Physics

Primary field (CPC G)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%

C08LCompositions of macromolecular compounds9%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%

C09DCoating compositions, e.g. paints, varnishes or lacquers4%

B29CShaping or joining of plastics2%

C07CAcyclic or carbocyclic compounds2%

C08JWorking-up2%

D21HPulp compositions2%

PatentTitleYear

7,495,332'Multilayer printed wiring board'2009 7,482,111'Negative radiation-sensitive resin composition'2009 7,247,420'Two-layer film and method of forming pattern with the same'2007 7,214,471'Photosensitive resin film and cured film made therefrom'2007 7,141,355'Radiation-sensitive resin composition'2006 6,727,032'Radiation-sensitive resin composition'2004 6,692,887'Radiation-sensitive resin composition'2004 6,517,744'Curing composition for forming a heat-conductive sheet, heat-conductive sheet, production thereof and heat sink structure'2003 6,322,949'Radiation sensitive resin composition'2001 6,242,161'Acrylic copolymer and reflection-preventing film-forming composition containing the same'2001 6,235,446'Radiation sensitive resin composition'2001 6,187,504'Radiation sensitive resin composition'2001 6,171,750'Radiation-sensitive resin composition'2001 6,143,460'Diazodisulfone compound and radiation-sensitive resin composition'2000 6,136,500'Radiation sensitive resin composition'2000 6,120,972'Radiation-sensitive resin composition'2000 6,007,961'Radiation-sensitive resin composition'1999 5,994,022'Radiation sensitive resin composition'1999 5,952,150'Radiation sensitive resin composition'1999 5,700,852'Paper coating composition'1997 4,996,134'Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer'1991 4,985,513'Conjugated diene copolymer, process for producing the same, and photosensitive resin composition comprising the same'1991 4,927,738'Conjugated diene copolymer, process for producing the same, and photosensitive resin composition comprising the same'1990 4,632,960'Resin composition comprising a thermosetting resin component and a functional, rubbery copolymer component'1986 4,599,382'Rubber composition comprising a thermosetting resin and a functional rubber-like copolymer'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986–1997Patents assigned to JAPAN SYNTHETIC RUBBER CO LTD (6)· patent assignee history

1986–2004Based in Yokkaichi, JP· patent location history

1999–2009Patents assigned to JSR CORP (19)· patent assignee history

1999–2001Based in Mie, JP· patent location history

2003–2009Based in Tokyo, JP· patent location history

2009Patents assigned to IBIDEN CO LTD (1)· patent assignee history

2009Based in Chuo-ku, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
JSR CORP	19	1999–2009
JAPAN SYNTHETIC RUBBER CO LTD	6	1986–1997
IBIDEN CO LTD	1	2009

Locations

Location	Patents	Span
Yokkaichi, JP	15	1986–2004
Tokyo, JP	5	2003–2009
Mie, JP	4	1999–2001
Chuo-ku, JP	1	2009