Inventor
XIANGZHAO WANG
Inventor
CN
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions28%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light28%
G01MTesting static or dynamic balance of machines or structures28%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
G02BOptical elements, systems or apparatus6%
PatentTitleYear
11,788,829Simultaneous phase-shift point diffraction interferometer and method for detecting wave aberration202311,668,625Apparatus and method for detecting wavefront aberration of objective lens202311,604,418Multi-channel device and method for measuring distortion and magnification of objective lens202311,561,082Method for compensation during the process of wavefront reconstruction in grating-based lateral shearing interferometry202311,340,118Method for high-accuracy wavefront measurement base on grating shearing interferometry202211,215,512Light intensity fluctuation-insensitive projection objective wave aberration detection device and detection method thereof2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2023Patents assigned to SHANGHAI INST OPTICS & FINE MECH CAS (6)· patent assignee history
2022–2023Based in CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHANGHAI INST OPTICS & FINE MECH CAS | 6 | 2022–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| CN | 6 | 2022–2023 |