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Inventor

Caiz Hong Tian

Inventor
Osaka, JP

Overview

3→
Patents
2006–2009
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H05HPlasma technique17%
PatentTitleYear
7,584,714'Method and system for improving coupling between a surface wave plasma source and a plasma space'20097,268,084'Method for treating a substrate'20077,138,767'Surface wave plasma processing system and method of using'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2009Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2006–2009Based in Osaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD32006–2009
Locations
LocationPatentsSpan
Osaka, JP32006–2009