Inventor
Kuniyasu Matsui
Inventor
Suwa, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Fprimary
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein22%
Y10TTechnical subjects covered by former us classification17%
G02BOptical elements, systems or apparatus11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
B29DProducing particular articles from plastics or from substances in a plastic state6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them6%
H01CResistors6%
H10NElectric solid-state devices not otherwise provided for6%
PatentTitleYear
7,265,909'Lens substrate, a transmission screen and a rear projection device'20077,193,308'Intermediate chip module, semiconductor device, circuit board, and electronic device'20077,045,443'Method for manufacturing semiconductor device, semiconductor device, circuit board, and electronic apparatus'20065,705,302'Color filter for liquid crystal display device and method for producing the color filter'19985,554,466'Color filter and method of preparation'19965,399,450'Method of preparation of a color filter by electrolytic deposition of a polymer material on a previously deposited pigment'19955,294,560'Bidirectional nonlinear resistor, active matrix liquid crystal panel using bidirectional nonlinear resistor, and method for production thereof'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2007Patents assigned to SEIKO EPSON CORP (7)· patent assignee history
1994–1998Based in Suwa, JP· patent location history
2006–2007Based in Hotaka-machi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO EPSON CORP | 7 | 1994–2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwa, JP | 4 | 1994–1998 |
| Hotaka-machi, JP | 3 | 2006–2007 |