Inventor

Ryouhei Hasegawa

Inventor

Joetsu-shi, JP

Overview

2015–2017

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary

B24BMachines, devices, or processes for grinding or polishing13%

B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form13%

C09GPolishing compositions13%

C09KMaterials for miscellaneous applications, not provided for elsewhere13%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%

H01LSemiconductor devices13%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

Y10TTechnical subjects covered by former us classification13%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2015–2017Patents assigned to SHINETSU CHEMICAL CO (2)· patent assignee history

2015Patents assigned to HASEGAWA RYOUHEI (1)· patent assignee history

2015Patents assigned to MATSUI HARUNOBU (1)· patent assignee history

2015Patents assigned to TAKEUCHI MASAKI (1)· patent assignee history

2015–2017Based in Joetsu-shi, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Joetsu-shi, JP	2	2015–2017