Inventor
Hidemasa Tamura
Inventor
Kanagawa, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C01Gprimary
C01GCompounds containing metals not covered by subclasses c01d or c01f18%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds14%
C04BLime, magnesia8%
C23CCoating metallic material6%
G11BInformation storage based on relative movement between record carrier and transducer6%
Y10TTechnical subjects covered by former us classification6%
B82YSpecific uses or applications of nanostructures4%
C08LCompositions of macromolecular compounds4%
C22CAlloys4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
6,086,735'Contoured sputtering target'20006,024,852'Sputtering target and production method thereof'20004,889,706'Method of manufacturing fine powder of lead stannate'19894,810,484'Method for manufacturing fine lead titanate powders'19894,677,083'Method for manufacturing dielectric fine powder of Ba.sub.1-x Sr.sub.x TiO.sub.3'19874,668,500'Method of producing bismuth titanate fine powders'19874,650,726'Ceramic substrate of Na.sub.2 O and Ta.sub.2 O.sub.5 for thin film magnetic head'19874,639,400'Ceramic substrate of Na.sub.2 O and Nb.sub.2 O.sub.5 for magnetic metal thin film'19874,595,580'Method for manufacturing fine powder of barium zirconate'19864,587,041'Method for manufacturing dielectric metal titanate'19864,585,718'Lithium-manganese dioxide cell'19864,547,355'Method for manufacturing fine powder of SrZrO.sub.3'19854,520,004'Method of manufacturing metal titanate fine powder'19854,438,160'Method of making a rotary ball display device'19844,434,202'Slide member'19844,235,663'Method of producing a dielectric of two-layer construction'19804,190,438'Amorphous magnetic alloy'19804,167,725'Dew-sensing hygroscopic element'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979–2000Patents assigned to SONY CORP (17)· patent assignee history
1979–1989Based in Yokohama, JP· patent location history
1984–1989Based in Kanagawa, JP· patent location history
2000Patents assigned to PRAXAIR TECHNOLOGY INC (1)· patent assignee history
2000Based in Sendai, JP· patent location history
2000Based in Miyagi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SONY CORP | 17 | 1979–2000 |
| PRAXAIR TECHNOLOGY INC | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 9 | 1984–1989 |
| Yokohama, JP | 7 | 1979–1989 |
| Sendai, JP | 1 | 2000 |
| Miyagi, JP | 1 | 2000 |