Inventor
Alexander Matyushkin
Inventor
San Jose, CA, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
H01JElectric discharge tubes or discharge lamps21%
H01LSemiconductor devices21%
B05CApparatus for applying fluent materials to surfaces, in general8%
H05BElectric heating8%
Y10TTechnical subjects covered by former us classification5%
C23CCoating metallic material3%
Y02PClimate change mitigation technologies in the production or processing of goods3%
PatentTitleYear
11,069,553Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity202111,024,532Electrostatic chuck design for cooling-gas light-up prevention202110,804,129Electrostatic chuck assembly incorporation a gasket for distributing RF power to a ceramic embedded electrode202010,257,887Substrate support assembly201910,083,853Electrostatic chuck design for cooling-gas light-up prevention201810,002,782ESC assembly including an electrically conductive gasket for uniform RF power delivery therethrough20189,883,549'Substrate support assembly having rapid temperature control'20189,275,887'Substrate processing with rapid temperature gradient control'20168,663,391'Electrostatic chuck having a plurality of heater coils'20148,226,769'Substrate support with electrostatic chuck having dual temperature zones'20127,846,254'Heat transfer assembly'20107,780,864'Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution'20107,727,413'Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density'20107,645,357'Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency'20107,436,645'Method and apparatus for controlling temperature of a substrate'20087,264,688'Plasma reactor apparatus with independent capacitive and toroidal plasma sources'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2019Patents assigned to APPLIED MATERIALS INC (11)· patent assignee history
2007–2021Based in San Jose, CA, US· patent location history
2012–2016Patents assigned to HOLLAND JOHN (3)· patent assignee history
2012–2016Patents assigned to MATYUSHKIN ALEXANDER (3)· patent assignee history
2012–2016Patents assigned to PANAGOPOULOS THEODOROS (3)· patent assignee history
2018–2021Patents assigned to LAM RES CORP (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 11 | 2007–2019 |
| LAM RES CORP | 5 | 2018–2021 |
| HOLLAND JOHN | 3 | 2012–2016 |
| MATYUSHKIN ALEXANDERself | 3 | 2012–2016 |
| PANAGOPOULOS THEODOROS | 3 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 16 | 2007–2021 |