Inventor
Kenichi Mitsumori
Inventor
Miyagi, JP
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
B08BCleaning in general12%
C02FTreatment of water, waste water, sewage, or sludge8%
B01FMixing, e.g. dissolving, emulsifying or dispersing7%
H05BElectric heating7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
C11DDetergent compositions5%
F03GSpring, weight, inertia or like motors5%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein5%
B81BMicrostructural devices or systems, e.g. micromechanical devices4%
PatentTitleYear
11,121,646Actuator element using carbon electrode202110,367,429Actuator element using carbon electrode20199,873,609Polymer actuator element20189,065,360'Polymer actuator device system'2015RE042566'Liquid feed nozzle, wet treatment, apparatus and wet treatment method'2011RE042420'Liquid feed nozzle, wet treatment apparatus and wet treatment method'20117,523,524'Ultrasonic cleaner and wet treatment nozzle comprising the same'20097,297,413'Plating substrate, electroless plating method, and circuit forming method using the same'20076,644,327'Ultrasonic cleaner and wet treatment nozzle comprising the same'20036,629,540'Wet treatment apparatus'20036,517,635'Liquid feed nozzle, wet treatment apparatus and wet treatment method'20036,509,305'Method for preparing cleaning solution'20036,446,358'Drying nozzle and drying device and cleaning device using the same'20026,325,359'Device and method for producing gas solution and cleaning device'20016,274,040'Apparatus for removing electrostatic charge from high resistivity liquid'20016,230,722'Liquid feed nozzle, wet treatment, apparatus and wet treatment method'20016,086,057'Method and device for preparing cleaning solution'20006,039,815'Cleaning method and apparatus for the same'20005,983,909'Cleaning method and apparatus for the same'19995,888,357'Apparatus and method for producing ionic water and system and method for producing electrolytic ionic water'19995,783,790'Wet treatment method'19985,550,484'Apparatus and method for inspecting thin film transistor'19965,480,563'Method for removing electrostatic charge from high resistivity liquid'19965,115,329'Electroluminescent device having a liquid crystal layer adjacent to the electroluminescent layer without any electrode placed therebetween'19925,027,036'Drive circuit for an electroluminescence display device'19914,777,402'Thin film EL display device having multiple EL layers'19884,758,828'Color thin-film EL display device'19884,758,765'Black layer for thin film EL display device'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–2018Patents assigned to ALPS ELECTRIC CO LTD (17)· patent assignee history
1988–1992Based in Furukawa, JP· patent location history
1996–2000Patents assigned to FRONTEC INC (5)· patent assignee history
1996–2018Based in Miyagi, JP· patent location history
1996–2003Based in Sendai, JP· patent location history
1998–2011Patents assigned to ORGANO CORP (6)· patent assignee history
1998–2003Patents assigned to OHMI TADAHIRO (4)· patent assignee history
2001–2021Based in Tokyo, JP· patent location history
2018–2019Patents assigned to AIST (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ALPS ELECTRIC CO LTD | 17 | 1988–2018 |
| ORGANO CORP | 6 | 1998–2011 |
| FRONTEC INC | 5 | 1996–2000 |
| OHMI TADAHIRO | 4 | 1998–2003 |
| AIST | 2 | 2018–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Miyagi, JP | 15 | 1996–2018 |
| Sendai, JP | 5 | 1996–2003 |
| Furukawa, JP | 5 | 1988–1992 |
| Tokyo, JP | 3 | 2001–2021 |