Inventor
Erik Byers
Inventor
Boise, ID, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
C30BSingle-crystal growth13%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein13%
H10HInorganic light-emitting semiconductor devices having potential barriers13%
H01LSemiconductor devices6%
H10BElectronic memory devices4%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
PatentTitleYear
9,842,965'Textured devices'20179,385,276'Epitaxial devices'20169,112,104'Epitaxial devices'20158,748,321'Method for epitaxial devices'20148,691,477'Reticle design for the reduction of lens heating phenomenon'20148,450,776'Epitaxial devices'20138,216,943'Epitaxial growth method'20127,446,855'Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure'20087,229,724'Reticles and methods of forming and using the same'20077,144,690'Photolithographic methods of using a single reticle to form overlapping patterns'20067,127,319'Reducing asymmetrically deposited film induced registration error'20066,852,456'Reducing asymmetrically deposited film induced registration error'20056,854,106'Reticles and methods of forming and using the same'20056,795,747'Reducing asymmetrically deposited film induced registration error'20046,670,109'Photolithographic methods of using a single reticle to form overlapping patterns'20036,653,241'Methods of forming protective segments of material, and etch stops'20036,620,734'Methods of forming protective segments of material, and etch stops'20036,486,956'Reducing asymmetrically deposited film induced registration error'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2017Patents assigned to MICRON TECHNOLOGY INC (17)· patent assignee history
2002–2017Based in Boise, ID, US· patent location history
2012–2014Patents assigned to BYERS ERIK (3)· patent assignee history
2012–2014Patents assigned to DEVILLIERS ANTON (3)· patent assignee history
2012–2013Patents assigned to SILLS SCOTT (2)· patent assignee history
2014Patents assigned to NANYA TECHNOLOGY CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 17 | 2002–2017 |
| BYERS ERIKself | 3 | 2012–2014 |
| DEVILLIERS ANTON | 3 | 2012–2014 |
| SILLS SCOTT | 2 | 2012–2013 |
| NANYA TECHNOLOGY CORP | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 18 | 2002–2017 |