Inventor

BRUNO GHYSELEN

Inventor
FR

Overview

27→
Patents
2022–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H01LSemiconductor devices19%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1016%
H10NElectric solid-state devices not otherwise provided for13%
C30BSingle-crystal growth11%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%
H03HImpedance networks, e.g. resonant circuits4%
B81BMicrostructural devices or systems, e.g. micromechanical devices3%
H10DInorganic electric semiconductor devices3%
B06BMethods or apparatus for generating or transmitting mechanical vibrations of infrasonic, sonic, or ultrasonic frequency, e.g. for performing mechanical work in general2%
PatentTitleYear
12,482,701Method for producing a stacked structure202512,448,284Membrane transfer method202512,421,622Method for producing a monocrystalline layer of lithium niobate by transferring a seed layer of yttria-stabilized zirconia to a silicon carrier substrate and epitaxially growing the monocrystalline layer of lithium niobate and substrate for epitaxial growth of a monocrystalline layer of lithium niobate202512,426,507Method for producing a crystalline layer of PZT material by transferring a seed layer of SRTIO3 to a silicon carrier substrate and epitaxially growing the crystalline layer of PZT, and substrate for epitaxial growth of a crystalline layer of PZT202512,356,858Method for the production of a single-crystal film, in particular piezoelectric202512,234,144Method for sealing cavities using membranes202512,178,133Methods for designing and producing a device comprising an array of micro-machined elements, and device produced by said methods202412,094,759Method for transferring blocks from a donor substrate onto a receiver substrate by implanting ions in the donor substrate through a mask, bonding the donor substrate to the receiver substrate, and detaching the donor substrate along an embrittlement plane202412,087,615Method for manufacturing a film on a support having a non-flat surface202412,071,706Process for producing a monoocrystalline layer of AlN material by transferring a SiC-6H seed to a Si carrier substrate and epitaxially growing the monocrystalline layer of AlN material and substrate for the epitaxial growth of a monocrystalline layer of AlN material202412,052,921Method for manufacturing a film on a flexible sheet202411,976,380Method for manufacturing a monocrystalline layer of GaAs material and substrate for epitaxial growth of a monocrystalline layer of GaAs material202411,939,214Method for manufacturing a device comprising a membrane extending over a cavity202411,940,407Micro-sensor for detecting chemical species and associated manufacturing method202411,935,743Method for manufacturing a monocrystalline layer of diamond or iridium material and substrate for epitaxially growing a monocrystalline layer of diamond or iridium material202411,913,134Process for manufacturing a two-dimensional film of hexagonal crystalline structure using epitaxial growth on a transferred thin metal film202411,877,514Method for producing a crystalline layer of PZT material by transferring a seed layer of SrTiO202411,828,000Method for producing a monocrystalline layer of lithium niobate by transferring a seed layer of yttria-stabilized zirconia to a silicon carrier substrate and epitaxially growing the monocrystalline layer of lithium niobate and substrate for epitaxial growth of a monocrystalline layer of lithium niobate202311,776,843Method for transferring blocks from a donor substrate onto a receiver substrate by implanting ions in the donor substrate through a mask, bonding the donor substrate to the receiver substrate, and detaching the donor substrate along an embrittlement plane202311,744,153Method for producing a layer by thinning and ion penetration202311,706,989Methods for designing and producing a device comprising an array of micromachined elements, and device produced by said methods202311,600,766Method for manufacturing a monocrystalline piezoelectric layer202311,557,715Method for manufacturing a film on a flexible sheet202311,549,195Method for manufacturing a monocrystalline layer of GaAs material and substrate for epitaxtial growth of a monocrystalline layer of GaAs material202311,398,595Method for treating a layer obtained by implantation then detachment from a substrate202211,373,897Method for manufacturing a film on a support having a non-flat surface202211,239,108Method for producing a donor substrate for creating a three-dimensional integrated structure, and method for producing such an integrated structure2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to SOITEC SILICON ON INSULATOR (27)· patent assignee history
2022–2025Based in FR· patent location history
2025Patents assigned to COMMISSARIAT ENERGIE ATOMIQUE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SOITEC SILICON ON INSULATOR272022–2025
COMMISSARIAT ENERGIE ATOMIQUE12025
Locations
LocationPatentsSpan
FR272022–2025