Inventor
Zhiwen KANG
Inventor
US
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
G01NInvestigating or analysing materials by determining their chemical or physical properties16%
G02BOptical elements, systems or apparatus16%
G01BMeasuring length, thickness or similar linear dimensions10%
G01CMeasuring distances, levels or bearings6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G09BEducational or demonstration appliances3%
PatentTitleYear
12,560,556Method and system of sample edge detection and sample positioning for image inspection apparatus202612,392,732Multi-source illumination unit and method of operating the same202512,217,927Beam manipulation of advanced charge controller module in a charged particle system202512,142,456Self-differential confocal tilt sensor for measuring level variation in charged particle beam system202412,072,181Inspection apparatus and method202411,808,930Optical objective lens202311,682,538Optical system with compensation lens202311,521,826Optical height detection system202211,183,360Optical system with compensation lens2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history
2021–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 9 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 9 | 2021–2026 |