Inventor
Hideo Kogure
Inventor
Atsugi, JP
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
H05KPrinted circuits13%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds12%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
Y10TTechnical subjects covered by former us classification6%
G21FProtection against x-radiation, gamma radiation, corpuscular radiation or particle bombardment3%
C01GCompounds containing metals not covered by subclasses c01d or c01f1%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds1%
C07DHeterocyclic compounds1%
PatentTitleYear
6,881,254'Coating material for inorganic-film formation and method of forming inorganic film from the coating material'20056,699,646'Positive type photosensitive resin composition and method for forming resist pattern'20046,664,029'Method of forming pattern'20036,660,457'Method of forming conductive pattern'20036,420,090'Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same'20026,344,307'Photosensitive resin composition'20026,331,376'Organic-solvent-based photocurable resist composition and resist pattern-forming method'20016,187,509'Positive type electrodeposition photoresist compositions and pattern formation process'20016,140,025'Negative type photosensitive resin composition and method for forming resist pattern'20006,124,077'Visible light-sensitive compositions and pattern formation process'20006,106,999'Photosensitizer, visible light curable resin composition using the same, and use of the composition'20006,093,518'Visible laser-curable composition'20006,054,251'Photopolymerizable composition'20005,939,148'Visible laser-curable composition'19995,624,781'Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition'19975,576,148'Process for production of printed circuit board'19965,455,117'Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method'19955,455,116'Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method'19955,453,328'Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method'19955,443,900'Electromagnetic wave absorber'19955,342,901'Film-formable, chelate-forming resin, process for preparation thereof, use thereof and method for forming electrophoretic coating'19945,281,449'Method of forming pattern coatings based on a radiation curable composition which contains a resin having both thioether and carboxyl groups'19945,196,487'Corrosion preventive resin and photopolymerizable composition incorporating same'19935,188,750'Anti-icing composition and method of preventing icing'19935,032,641'Water-repellent film-forming composition'19914,130,431'Metal surface treatment liquid and rust preventive paint'19784,097,287'Inorganic film forming composition for coating'19783,951,667'Inorganic anticorrosive coating material'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–2005Patents assigned to KANSAI PAINT CO LTD (28)· patent assignee history
1976–1995Based in Hiratsuka, JP· patent location history
1991–2003Based in Atsugi, JP· patent location history
2000Patents assigned to MITSUI CHEMICALS (1)· patent assignee history
2000–2005Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KANSAI PAINT CO LTD | 28 | 1976–2005 |
| MITSUI CHEMICALS | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Atsugi, JP | 14 | 1991–2003 |
| Kanagawa, JP | 7 | 2000–2005 |
| Hiratsuka, JP | 7 | 1976–1995 |