Inventor
Kiyoshi Motomi
Inventor
Nishikamo-gun, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds20%
H05KPrinted circuits20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
PatentTitleYear
6,156,477'Polymers and chemically amplified positive resist compositions'20005,849,461'Chemically amplified positive resist composition'19985,750,309'Chemically amplified positive resist composition'19985,494,991'Polyimides and processes for preparing the same'19965,478,914'Polyimides and processes for preparaing the same'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2000Patents assigned to SHINETSU CHEMICAL CO (5)· patent assignee history
1995–1996Based in Ibaraki, JP· patent location history
1998–2000Based in Nishikamo-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 5 | 1995–2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nishikamo-gun, JP | 3 | 1998–2000 |
| Ibaraki, JP | 2 | 1995–1996 |