Inventor
Masato Hamada
Inventor
Yokohama, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material10%
C25BElectrolytic or electrophoretic processes for the production of compounds or non-metals10%
C25DProcesses for the electrolytic or electrophoretic production of coatings10%
H01LSemiconductor devices10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
B05DProcesses for applying fluent materials to surfaces, in general5%
C07CAcyclic or carbocyclic compounds5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08JWorking-up5%
PatentTitleYear
10,903,081Substrate processing method202110,392,719Electrolytic treatment apparatus and electrolytic treatment method201910,354,915Adhesion layer forming method, adhesion layer forming system and recording medium20197,107,458'Authentication communicating semiconductor device'20064,734,474'Fluorine-containing sulfonyl polymer'19884,466,881'Process for the preparation of (.omega.-fluorosulfonyl)haloaliphatic carboxylic acid fluorides'19844,425,199'Process for the preparation of (.omega.-fluorosulfonyl)-haloaliphatic carboxylic acid fluorides'19844,126,589'Method for preparation of cation exchange membranes'19783,981,906'Process for preparing alkyl 4,4\'-(ethylenedioxy)bis-benzoates'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1988Patents assigned to ASAHI CHEMICAL IND (5)· patent assignee history
1976–1988Based in Yokohama, JP· patent location history
2006Patents assigned to RENESAS TECH CORP (1)· patent assignee history
2006Based in Nishitokyo, JP· patent location history
2019–2021Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2019–2021Based in Nirasaki, JP· patent location history
2019Based in Kumamoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASAHI CHEMICAL IND | 5 | 1976–1988 |
| TOKYO ELECTRON LTD | 3 | 2019–2021 |
| RENESAS TECH CORP | 1 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 5 | 1976–1988 |
| Nirasaki, JP | 2 | 2019–2021 |
| Kumamoto, JP | 1 | 2019 |
| Nishitokyo, JP | 1 | 2006 |