Inventor
Lucas Henricus Johannes Stevens
Inventor
Eindhoven, NL
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
B82YSpecific uses or applications of nanostructures9%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them9%
C01BNon-metallic elements7%
G02BOptical elements, systems or apparatus7%
G21KHandling of particles or ionising radiation not otherwise provided for7%
H01BCables7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
Y10TTechnical subjects covered by former us classification5%
PatentTitleYear
10,871,715Lithographic apparatus and a device manufacturing method202010,481,510Graphene spectral purity filter20199,989,844Pellicle for reticle and multilayer mirror20189,645,502'Lithographic apparatus, programmable patterning device and lithographic method'20179,482,960'Pellicle for reticle and multilayer mirror'20169,395,630'Lithographic apparatus and method'20169,304,077'Inspection apparatus and method'20168,547,551'Lithographic apparatus and contamination detection method'20138,445,873'System and method for detecting at least one contamination species in a lithographic apparatus'20138,217,347'System and method for detecting at least one contamination species in a lithographic apparatus'20128,149,379'Lithographic apparatus and device manufacturing method'20127,928,412'Lithographic apparatus, and device manufacturing method'20117,897,110'System and method for detecting at least one contamination species in a lithographic apparatus'20117,800,079'Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method'20107,629,594'Lithographic apparatus, and device manufacturing method'20097,528,395'Radiation source, lithographic apparatus and device manufacturing method'20097,405,417'Lithographic apparatus having a monitoring device for detecting contamination'20087,167,232'Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus'20077,095,479'Lithographic apparatus, device manufacturing method and device manufactured thereby'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2020Patents assigned to ASML NETHERLANDS BV (19)· patent assignee history
2006–2020Based in Eindhoven, NL· patent location history
2012–2017Patents assigned to STEVENS LUCAS HENRICUS JOHANNES (7)· patent assignee history
2012–2017Patents assigned to BANINE VADIM YEVGENYEVICH (4)· patent assignee history
2012–2013Patents assigned to MOORS JOHANNES HUBERTUS JOSEPHINA (3)· patent assignee history
2012–2013Patents assigned to BAKKER LEVINUS PIETER (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 19 | 2006–2020 |
| STEVENS LUCAS HENRICUS JOHANNESself | 7 | 2012–2017 |
| BANINE VADIM YEVGENYEVICH | 4 | 2012–2017 |
| MOORS JOHANNES HUBERTUS JOSEPHINA | 3 | 2012–2013 |
| BAKKER LEVINUS PIETER | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 19 | 2006–2020 |