Inventor

Hans-Peter Feuerbaum

Inventor

Munich, DE

Overview

43→

Patents

1979–2012

Patent span

Electricity

Primary field (CPC H)

Patents· 43 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps60%

G01RMeasuring electric variables32%

B82YSpecific uses or applications of nanostructures4%

G01NInvestigating or analysing materials by determining their chemical or physical properties2%

G09GArrangements or circuits for control of indicating devices using static means to present variable information2%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%

PatentTitleYear

8,203,119'Charged particle beam device with retarding field analyzer'2012 7,652,263'Focussing lens for charged particle beams'2010 7,638,777'Imaging system with multi source array'2009 7,586,093'Apparatus and method for inspecting a sample of a specimen by means of an electron beam'2009 7,274,018'Charged particle beam apparatus and method for operating the same'2007 7,075,092'Charged particle beam microscope with minicolumn'2006 7,045,781'Charged particle beam apparatus and method for operating the same'2006 6,943,349'Multi beam charged particle device'2005 6,936,817'Optical column for charged particle beam device'2005 6,740,889'Charged particle beam microscope with minicolumn'2004 6,730,907'Charged particle device'2004 6,576,908'Beam column for charged particle beam device'2003 6,555,824'Method and device for focusing a charged particle beam'2003 6,555,815'Apparatus and method for examining specimen with a charged particle beam'2003 5,834,773'Method and apparatus for testing the function of microstructure elements'1998 5,780,859'Electrostatic-magnetic lens arrangement'1998 5,422,486'Scanning electron beam device'1995 5,329,125'Device for corpuscular-optical examination and/or processing of material samples'1994 5,041,724'Method of operating an electron beam measuring device'1991 4,831,266'Detector objective for particle beam apparatus'1989 4,812,651'Spectrometer objective for particle beam measuring instruments'1989 4,808,821'Spectrometer objective for electron beam mensuration techniques'1989 4,733,176'Method and apparatus for locating defects in an electrical circuit with a light beam'1988 4,713,543'Scanning particle microscope'1987 4,686,466'Method for automatically setting the voltage resolution in particle beam measuring devices and apparatus for implementation thereof'1987 4,683,376'Opposing field spectrometer for electron beam mensuration technology'1987 4,675,602'Method for automatically setting an operating point given signal curve measurements with a particle beam measuring apparatus'1987 4,651,003'Particle-accelerating electrode'1987 4,539,477'Method and apparatus for suppressing disturbances in the measurement of signals with a particle probe'1985 4,514,682'Secondary electron spectrometer for measuring voltages on a sample utilizing an electron probe'1985 4,486,660'Electron beam testing device for stroboscopic measurement of high-frequency, periodic events'1984 4,471,302'Method for representing logical status changes of a plurality of adjacent circuit nodes in an integrated circuit in a logic image employing a pulsed electron probe'1984 4,460,866'Method for measuring resistances and capacitances of electronic components'1984 4,413,181'Arrangement for stroboscopic potential measurements with an electron beam testing device'1983 4,412,191'Method and arrangement for quantitative potential measurements on surface-wave filters'1983 4,296,372'Techniques for impressing a voltage with an electron beam'1981 4,292,519'Device for contact-free potential measurements'1981 4,277,679'Apparatus and method for contact-free potential measurements of an electronic composition'1981 4,241,259'Scanning electron microscope'1980 4,223,220'Method for electronically imaging the potential distribution in an electronic component and arrangement for implementing the method'1980 4,220,853'Method for the contactless measurement of the potential waveform in an electronic component and arrangement for implementing the method'1980 4,220,854'Method for the contactless measurement of the potential waveform in an electronic component and apparatus for implementing the method'1980 4,169,229'Apparatus for keying in electron beams'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1979–1989Patents assigned to SIEMENS AG (23)· patent assignee history

1979–2012Based in Munich, DE· patent location history

1987–2012Patents assigned to INTEGRATED CIRCUIT TESTING (13)· patent assignee history

1995–2007Based in Heimstetten, DE· patent location history

1998Patents assigned to ACT ADVANCED CIRCUIT TESTING (1)· patent assignee history

2003–2006Patents assigned to APPLIED MATERIALS INC (5)· patent assignee history

2004Based in Mnchen, DE· patent location history

2006Based in MÃ¼nchen, DE· patent location history

2012Patents assigned to DEGENHARDT RALF (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SIEMENS AG	23	1979–1989
INTEGRATED CIRCUIT TESTING	13	1987–2012
APPLIED MATERIALS INC	5	2003–2006
ACT ADVANCED CIRCUIT TESTING	1	1998
DEGENHARDT RALF	1	2012

Locations

Location	Patents	Span
Munich, DE	37	1979–2012
Heimstetten, DE	4	1995–2007
MÃ¼nchen, DE	1	2006
Mnchen, DE	1	2004