Inventor
NAOFUMI OHASHI
Inventor
JP
Overview
Patents· 38 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01LSemiconductor devices27%
C23CCoating metallic material17%
H01JElectric discharge tubes or discharge lamps7%
G05BControl or regulating systems in general3%
B25JManipulators2%
F27BFurnaces, kilns, ovens or retorts in general2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace2%
G01HMeasurement of mechanical vibrations or ultrasonic, sonic or infrasonic waves2%
PatentTitleYear
12,581,882Substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium202612,581,902Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium202612,567,571Method of manufacturing semiconductor device202612,424,409Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium202512,392,032Substrate processing apparatus with cleaning of exhaust system202512,387,949Substrate processing apparatus202512,327,755Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium202512,327,720Method of processing substrate, substrate processing apparatus, recording medium, and manufacturing semiconductor device202512,320,778Method of processing substrate, substrate processing apparatus, method of manufacturing semiconductor processing apparatus, and recording medium202512,224,185Method of manufacturing semiconductor device202512,165,894Processing method, method of manufacturing semiconductor, and substrate processing apparatus202412,131,902Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium202412,106,998Substrate processing apparatus, substrate processing method, non-transitory computer-readable recording medium and method of manufacturing semiconductor device202412,091,751Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium202412,093,021Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium202411,967,513Substrate processing apparatus202411,926,893Substrate processing apparatus, substrate processing method and non-transitory computer-readable recording medium therefor202411,923,173Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium202411,891,697Substrate processing apparatus202411,841,343Method of processing substrate, substrate processing apparatus, method of manufacturing semiconductor processing apparatus, and recording medium202311,749,550Method of manufacturing semiconductor device by setting process chamber maintenance enable state202311,747,789Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium202311,728,183Method of manufacturing semiconductor device202311,664,205Substrate processing apparatus202311,600,488Method of manufacturing semiconductor device202311,538,661Substrate processing apparatus202211,530,481Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium202211,521,848Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium202211,473,196Substrate processing apparatus202211,422,528Substrate processing system, method of manufacturing semiconductor device, and recording medium202211,380,540Substrate processing apparatus202211,355,372Method of manufacturing semiconductor device by setting process chamber to maintenance enable state202211,342,212Method of manufacturing semiconductor device by setting process chamber maintenance enable state202211,322,370Method of manufacturing semiconductor device202211,314,234Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium202211,305,986Method of manufacturing semiconductor device, substrate processing apparatus and program202211,289,350Method of manufacturing semiconductor device202211,145,505Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to KOKUSAI ELECTRIC CORP (38)· patent assignee history
2021–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KOKUSAI ELECTRIC CORP | 38 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 38 | 2021–2026 |