Inventor
Naoyoshi Jinno
Inventor
Osaka, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
D21Hprimary
D21HPulp compositions22%
A01NPreservation of bodies of humans or animals or plants or parts thereof11%
A61KPreparations for medical, dental or toiletry purposes11%
A61QSpecific use of cosmetics or similar toiletry preparations11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
Y10TTechnical subjects covered by former us classification11%
PatentTitleYear
4,863,829'Positive type high gamma-value photoresist composition with novolak resin possessing'19894,464,505'Coating composition for providing water and blister resistant, ink-receptive paper'19844,251,651'Amphoteric polyelectrolyte'19814,164,413'Method for promoting growth of plants with cationic polymers'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979–1989Patents assigned to SUMITOMO CHEMICAL CO (4)· patent assignee history
1979Based in Ibaraki, JP· patent location history
1981–1989Based in Osaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 4 | 1979–1989 |
Locations
| Location | Patents | Span |
|---|---|---|
| Osaka, JP | 3 | 1981–1989 |
| Ibaraki, JP | 1 | 1979 |