Inventor
Michael C. Triplett
Inventor
Colchester, VT, US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices27%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
C23CCoating metallic material13%
H10BElectronic memory devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C30BSingle-crystal growth7%
H01JElectric discharge tubes or discharge lamps7%
PatentTitleYear
7,521,748'Method to eliminate arsenic contamination in trench capacitors'20097,378,712'Gate stacks'20087,294,554'Method to eliminate arsenic contamination in trench capacitors'20077,205,216'Modification of electrical properties for semiconductor wafers'20077,157,341'Gate stacks'20076,864,189'Methodology for measuring and controlling film thickness profiles'20056,774,019'Incorporation of an impurity into a thin film'20046,060,397'Gas chemistry for improved in-situ cleaning of residue for a CVD apparatus'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2000Based in Essex Junction, VT, US· patent location history
2004–2009Patents assigned to IBM (7)· patent assignee history
2004–2009Based in Colchester, VT, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 7 | 2004–2009 |
| APPLIED MATERIALS INC | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Colchester, VT, US | 7 | 2004–2009 |
| Essex Junction, VT, US | 1 | 2000 |