Inventor
Yasusi Umeda
Inventor
Osaka, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
G03GElectrography29%
G03CPhotosensitive materials for photographic purposes14%
H04NPictorial communication, e.g. television14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977Patents assigned to NIPPON PAINT (1)· patent assignee history
1977–1981Based in Osaka, JP· patent location history
1981Patents assigned to NIPPON PAINT CO LTD (2)· patent assignee history
1981Based in Neyagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIPPON PAINT CO LTD | 2 | 1981 |
| NIPPON PAINT | 1 | 1977 |
Locations
| Location | Patents | Span |
|---|---|---|
| Osaka, JP | 2 | 1977–1981 |
| Neyagawa, JP | 1 | 1981 |