Inventor
Yukinori Sakiyama
Inventor
West Linn, OR, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material24%
H01LSemiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H01JElectric discharge tubes or discharge lamps22%
H05HPlasma technique5%
B05CApparatus for applying fluent materials to surfaces, in general2%
PatentTitleYear
10,622,243Planar substrate edge contact with open volume equalization pathways and side containment202010,553,465Control of water bow in multiple stations202010,510,625Systems and methods for controlling plasma instability in semiconductor fabrication201910,475,627Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition201910,378,107Low volume showerhead with faceplate holes for improved flow uniformity201910,301,718Asymmetric pedestal/carrier ring arrangement for edge impedance modulation201910,128,160Systems and methods for detection of plasma instability by electrical measurement201810,121,708Systems and methods for detection of plasma instability by optical diagnosis20189,997,422Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability20189,941,113Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication20189,875,883Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching20189,824,941'Systems and methods for detection of plasma instability by electrical measurement'20179,754,769'Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching'20179,644,271'Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication'20179,508,547'Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2020Patents assigned to LAM RES CORP (15)· patent assignee history
2016–2020Based in West Linn, OR, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 15 | 2016–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| West Linn, OR, US | 15 | 2016–2020 |