Inventor
YONGJING LIN
Inventor
US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H10DInorganic electric semiconductor devices21%
H10BElectronic memory devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
C23CCoating metallic material6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H01JElectric discharge tubes or discharge lamps3%
PatentTitleYear
12,328,872Liner for V-NAND word line stack202511,996,455P-type dipole for P-FET202411,888,045Integrated dipole flow for transistor202411,658,218P-type dipole for p-FET202311,476,267Liner for V-NAND word line stack202211,289,579P-type dipole for p-FET202211,276,569On stack overlay improvement for 3D NAND202211,245,022Integrated dipole flow for transistor2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to APPLIED MATERIALS INC (8)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 8 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 8 | 2022–2025 |