Inventor
Nagesh SHIRALI
Inventor
US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
H01JElectric discharge tubes or discharge lamps24%
G06FElectric digital data processing16%
G06NComputing arrangements based on specific computational models10%
G06TImage data processing or generation, in general8%
H10DInorganic electric semiconductor devices8%
G05BControl or regulating systems in general6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
PatentTitleYear
12,579,353Computing parasitic values for semiconductor designs202612,499,301Computing parasitic values for semiconductor designs202512,488,175Methods and systems to determine parasitics for semiconductor or flat panel display fabrication202512,387,029Computing parasitic values for semiconductor designs202512,372,864Methods and systems to determine shapes for semiconductor or flat panel display fabrication202512,340,164Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate202512,287,567Method and system for reticle enhancement technology202512,248,242Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate202512,243,712Method and system for determining a charged particle beam exposure for a local pattern density202512,019,973Method for reticle enhancement technology of a design pattern to be manufactured on a substrate202411,953,824Method for reticle enhancement technology of a design pattern to be manufactured on a substrate202411,921,420Method and system for reticle enhancement technology202411,886,166Method and system of reducing charged particle beam write time202411,783,110Method for reticle enhancement technology of a design pattern to be manufactured on a substrate202311,756,765Method and system for determining a charged particle beam exposure for a local pattern density202311,693,306Method for reticle enhancement technology of a design pattern to be manufactured on a substrate202311,604,451Method and system of reducing charged particle beam write time202311,592,802Method and system of reducing charged particle beam write time2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2026Patents assigned to D2S INC (18)· patent assignee history
2023–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| D2S INC | 18 | 2023–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 18 | 2023–2026 |