Inventor
Takao Inada
Inventor
Hsinchu, TW
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices42%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
10,651,061Substrate processing apparatus, substrate processing method and recording medium202010,643,874Substrate liquid processing apparatus, substrate liquid processing method, and storage medium20209,224,624'Liquid processing method'20159,070,549'Substrate processing apparatus and substrate processing method'20158,951,359'Liquid processing apparatus, liquid processing method and computer-readable storage medium storing liquid processing program'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2020Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2015Patents assigned to INADA TAKAO (2)· patent assignee history
2015Patents assigned to HACHIYA YOSUKE (1)· patent assignee history
2015Patents assigned to OKAMURA NAOYUKI (1)· patent assignee history
2015Patents assigned to SHIOKAWA TOSHIYUKI (1)· patent assignee history
2015Based in Hsinchu, TW· patent location history
2015Based in Tosu, JP· patent location history
2020Based in Koshi, JP· patent location history
2020Based in Kumamoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 5 | 2015–2020 |
| INADA TAKAOself | 2 | 2015 |
| HACHIYA YOSUKE | 1 | 2015 |
| OKAMURA NAOYUKI | 1 | 2015 |
| SHIOKAWA TOSHIYUKI | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 2 | 2015 |
| Koshi, JP | 1 | 2020 |
| Kumamoto, JP | 1 | 2020 |
| Tosu, JP | 1 | 2015 |